سال انتشار: ۱۳۸۶

محل انتشار: دومین کنفرانس نانوساختارها

تعداد صفحات: ۲

نویسنده(ها):

M.M Ahadian – Institute for Nanoscience and Nanotechnology
R Rasuli – Department of Physics, Sharif University of Technology
A Iraji zad – Institute for Nanoscience and Nanotechnology

چکیده:

Surface segregation, whereby one species tends to preferentially move to free surface, is a hindrance phenomenon in obtaining sharp interfaces in multilayers with nanometer thickness. In this work, we have studied Cu surface segregation during ultra thin Ni deposition onto Cu substrate and during heat treatment in ultra high vacuum (UHV). X-ray photoelectron spectroscopy (XPS), Auger electron spectroscopy (AES) and atomic force microscopy (AFM) were used to study the surface in nanometer scale. XPS analysis revealed that the accumulated Cu is uniform over the surface with thickness of one monolayer